Nanoimprint Lithography Processing of Inorganic-Based Materials

We review past and recent progress in Nano-Imprint Lithography (NIL) methods to (nano-) structure inorganic materials from sol-gel liquid formulations colloidal suspensions onto a surface. This technique, first inspired by embossing techniques, was developed for soft polymer processing, as final or intermediate materials, but is today fully adapted hard with high dielectric constant, such metal oxides, countless chemical compositions provided the chemistry. Consequently, NIL has become versatile, throughput, highly precise microfabrication method that mature lab developments scaling up. describe state-of-the-art nanofabrication plethora of approaches last decades imprint oxides solutions. These are discussed compared terms performances, issues, ease implementation. The part devoted relevant applications domains interest.